SU-8 photolithography

SU-8 is a negative epoxy based photoresist that allows for the fabrication of high aspect ratio microstructures with high resolution using standard UV lithography. Stephan Sylvest Keller has  more than 10 years of experience with SU-8 which resulted in complete redesign of the processes. Among others, SU-8 has been used for the fabrication of micromechanical sensors, drug delivery devices and precursor structures for pyrolysis.
Left: Fabrication of high aspect ratio micropillars with two steps of SU-8 photolithography; right: Fabrication of suspended SU-8 microstructures using partial exposure

Publications

  1. S. Keller, G. Blagoi, M. Lillemose, D. Haefliger, A. Boisen, "Processing of thin SU-8 films", J. Micromech. Microeng. 18 (2008) 125020 (10pp)

  2. S. Keller, D. Haefliger, A. Boisen, “Fabrication of thin SU-8 cantilevers: initial bending, release and time-stability”, J. Micromech. Microeng. 20 (2010) 045024-045035

  3. L. Amato, S.S. Keller, A. Heiskanen, M. Dimaki, J. Emnéus, A. Boisen, M. Tenje ”Fabrication of high-aspect ratio SU-8 micropillar arrays”, Microelec. Eng. 98 (2012) 483 

  4. S. Hemanth, C. Caviglia, L. Amato, T.A. Anhøj, A. Heiskanen, J. Emnéus, S.S. KellerPyrolytic 3D carbon microelectrodes for electrochemistry”, Proceedings of Annual meeting of electrochemical society (ECS) (2016)

 

 

Last updated 14.12.2016, Stephan Sylvest Keller

 
 
 
https://www.nanolab.dtu.dk/english/Research/biomic/Microfabrication/SU-8-photolithography
16 DECEMBER 2019