Presentations from NNUM 2019

Here you find most of the presentations

Invited Speakers

Henri Jansen DTU Nanolab: Generic build-up of silicon plasma etch processes: a practical guide to directional profiles

Per-Erik Hellström, KTH: CMOS processing line for heterogenous integration at KTH



C1: X-ray Photoelectron Spectroscopy: a powerful characterization tool in material science and biotechnology, Hamid Khanmohammadi, NTNU BASIC

C2: FT-IR and Raman Spectroscopies: Principles and Applications, Philip M. Weiser, Oslo UiO BASIC

C3: Diffraction Techniques in the Scanning Electron Microscope (SEM), Alice Bastos S. Fanta, DTU Nanolab ADVANCED Part1 Part2

C4: Transmission Electron Microscopy (TEM): Combining analytical methods of imaging, diffraction, and spectroscopy, Lars Riekehr, Uppsala Ångström ADVANCED

C5: Intermodulation AFM: material properties at high speed and high resolution, Daniel Forchheimer, KTH ADVANCED

Thin Film technologies

T1: Thin film deposition tehcniques, Kristin Bergum, Oslo UiO BASIC

T2: Magnetron sputtering, Tomas Kubart, Uppsala Ångström ADVANCED

T3: Atomic Layer Deposition (ALD), Pernille V. Larsen & Evgeniy Shkondin, DTU Nanolab BASIC

T4: Epitaxial growth, Matthias Hammar, KTH BASIC

T5: From atoms to microfilms: a journey in thin film deposition technology, Ruggero Verre, Chalmers BASIC

Etching technologies

E1: Generic build-up of etch process: 3D-sculpturing by Si plasma etching, Bingdong Chang, DTU Nanolab ADVANCED

E2: Chemical Mechanical Polishing, Corrado Capriata, KTH BASIC

E3: Wet etching techniques, Karin Hedsten, Chalmers BASIC

E4: Atomic Layer Etching, Sabbir Ahmed Khan, KU/NBI BASIC

E5: Etching AlGaN alloys using ICP-RIE, Leidulv Vigen, NTNU BASIC


L1: EBL hardware basics and craftsmanship, Marcus Rommel, Chalmers BASIC

L2: Electron beam lithography - process, principles, and capabilities, Jakob Vinje & Einar Digernes, NTNU BASIC

L3: Talbot displacement lithography, Mariusz Graczyk, Lund Nano Lab BASIC

L4: Block copolymer nanolithography, Anette Löfstrand, Lund Nano Lab BASIC

L5: Introduction to maskless UV-lithography, Lean Gottlieb Pedersen, DTU Nanolab BASIC