MultiChamper

New and better technology

Wednesday 24 Jun 20
|
by Tom Nervil
In order to provide better service, better processes and better results DTU Nanolab has invested in state of the art infrastructure. Latest investments are the Multi-chamber high vacuum sputtering deposition system and the X-ray photoelectron spectroscopy (XPS) system.

Multi-chamber high vacuum sputtering deposition system 

To strengthen and expand the PVD deposition capabilities at DTU Nanolab we have invested in a new cluster based system from the company Kurt J. Lesker which includes two separate sputtering deposition chambers (2x PRO Line PVD 75) on a common loadlock/dealer platform. This means that it will be possible after deposition(s) in one chamber to transfer the substrates to the other chamber without breaking vacuum thus expanding the possibilities for multilayer depositions tremendously. The loadlock takes a 10-substrates (100 mm/150 mm) cassette meaning that the system is capable of batch processing.

The two deposition chambers are dedicated for different materials in order to prevent cross-contamination issues between certain types of materials. As a starting point, one system is used for metals and metal-oxides while the other is set up for metals and metal-nitrides. The exact division of materials (which metals will go where) will be decided later and will be adapted to the needs. 
Besides the division of material platforms the cluster system will offer new deposition capabilities regarding sputtering techniques. In addition to the conventional DC- and RF sputtering modes we have invested in magnetron power supplies providing pulsed DC and HiPIMS (High Power Impulse Magnetron Sputtering) for both deposition systems. Thereby, we will now basically offer all the “conventional” sputtering techniques in addition to some of the more exotic techniques in the same system. We believe that with this equipment we can offer a highly versatile and flexible tool for both researchers and companies working in the cleanroom in the years to come.

X-ray photoelectron spectroscopy (XPS) system

 

To prepare for future decommissioning of our heavily used and old K-Alpha XPS we have invested in the next generation XPS-Nexsa surface analysis system, which expands our analysis capabilities substantially including XPS (ARXPS), UPS (ARUPS), ISS, REELS, and Raman spectroscopy.

In short, the techniques provide the following:

  • XPS: X-ray photoelectron spectroscopy provides
    quantified chemical state information from the surface
    of the sample.
  • UPS: UV photoelectron spectroscopy provides
    information from the valence electrons
  • MAGCIS: Monatomic & gas cluster ion source which
    extends the depth profiling capabilities to be able to
    analyze “soft” layered materials such as polymers.
  • ISS: Ion scattering spectroscopy provides elemental
    composition information from the top atomic layer of
    the surface.
  • REELS: Reflected electron energy loss spectroscopy
    provides information on electronic structure and can
    measure the presence of hydrogen
  • Raman: Molecular bonding and structural information

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