SU-8 is a negative epoxy based photoresist that allows for the fabrication of high aspect ratio microstructures with high resolution using standard UV lithography. Stephan Sylvest Keller has more than 10 years of experience with SU-8 which resulted in complete redesign of the processes. Among others, SU-8 has been used for the fabrication of micromechanical sensors, drug delivery devices and precursor structures for pyrolysis.
Left: Fabrication of high aspect ratio micropillars with two steps of SU-8 photolithography; right: Fabrication of suspended SU-8 microstructures using partial exposure
Publications
- S. Keller, G. Blagoi, M. Lillemose, D. Haefliger, A. Boisen, "Processing of thin SU-8 films", J. Micromech. Microeng. 18 (2008) 125020 (10pp)
- S. Keller, D. Haefliger, A. Boisen, “Fabrication of thin SU-8 cantilevers: initial bending, release and time-stability”, J. Micromech. Microeng. 20 (2010) 045024-045035
- L. Amato, S.S. Keller, A. Heiskanen, M. Dimaki, J. Emnéus, A. Boisen, M. Tenje ”Fabrication of high-aspect ratio SU-8 micropillar arrays”, Microelec. Eng. 98 (2012) 483
- S. Hemanth, C. Caviglia, L. Amato, T.A. Anhøj, A. Heiskanen, J. Emnéus, S.S. Keller ”Pyrolytic 3D carbon microelectrodes for electrochemistry”, Proceedings of Annual meeting of electrochemical society (ECS) (2016)
Last updated 14.12.2016, Stephan Sylvest Keller