DTU Nanolab will host the Nano-Micro-Lithography Symposium (NMLS) 2026 on 27-28 January 2026 at our facilities in Kongens Lyngby, Denmark. The symposium will be held as an in-person event and will bring together researchers, technical experts and users working within nano- and microfabrication.
The programme will feature contributions from Nanoscribe, Heidelberg Instruments, GenISys and micro resist technology, focusing on current developments in lithography as well as emerging technologies and future perspectives. Participants will have the opportunity to engage directly with experts and to explore advanced lithography systems in a working laboratory environment at DTU Nanolab.
In connection with the symposium, DTU Nanolab will also mark the grand opening of the PolyFabLab on Tuesday, 27 January, from 11:00-13:00. The opening will include a short programme of speeches followed by a reception, celebrating an important milestone as the new laboratory nears completion.
Participation in the symposium is open to researchers and professionals in the field. Early registration is encouraged.
Further information and registration is available via the link below:
Programme and registration for Nano-Micro-Lithography Symposium (NMLS) 2026
